Used EVG / EV GROUP 8002 #9384858 for sale

EVG / EV GROUP 8002 is a photoresist equipment suited for a variety of applications. This system features a photolithography platform that is ideal for small to medium sized applications and features an integrated 6-axis robot designed for use in micro-electronics unit manufacturing processes. The machine is also capable of aligning its components with a precision of 5 micrometers, making it a useful tool for a wide range of processes. The photolithography aspect of EVG 8002 consists of two main components: a Laser Interferomtre (LIF) and a Broad Band Sourcing Alignment (BBSA). The LIF is used to accurately measure the positional tolerance with a resolution of 1 micrometer. This aspect is ideal for ensuring precise placement of components during alignment and refocusing operations. The BBSA, on the other hand, is the main source of radiation used in the photolithography step. It can emit light with wavelengths ranging from 300 to 1400 nanometers and provides the necessary energy to expose photosensitive parts to the desired radiation levels. In terms of equipment, EV GROUP 8002 comes with a range of kits designed to meet your specific application. This includes a wafer transport module, substrate holder, and mask plate holder. Additionally, the tool is also provided with a wide selection of optics to suit your application, ranging from a variety of lenses, reflectors and condensers, along with optional accessories such as a neutral density filter. The core of 8002 is the automated 6-axis robot which allows for precise and repeatable positioning of the mask plate and wafer. This robot also can automatically track the movement of the mask plate and wafer, keeping track of the positional tolerance and exposure times relative to the substrate holder, enabling superior placement accuracy and minimal drift. Previous exposure settings can also be reclaimed for use in later production batches, ensuring that the process are consistent over time. In terms of performance, EVG / EV GROUP 8002 has a minimum step size of 0.1 micrometer and a repeatability of 5 micrometer, regardless of the temperature fluctuations. This level of accuracy allows for excellent precision and repeatability, making it a great solution for tight tolerance applications. The asset also operates with a cycle time of 15 seconds and a maximum throughput of 10 parts per hour, making it ideal for small to medium sized production requirements. To sum up, EVG 8002 is a powerful photolithography model capable of precise alignment and exposure of parts with a resolution of 5 micrometers. The integrated 6-axis robot makes it possible to accurately track the movement of the mask plate and wafer, while the wide selection of optics offer custom compatibility. This combination of features provides EVG with the flexibility necessary for a range of applications, making it a great tool for most manufacturing processes.