Used FISA CC20/40 #9395454 for sale

FISA CC20/40 is a cobalt-based photoresist equipment developed specifically for use in lithography and dry film processes. This photoresist system allows for very high resolution and improved resolution characteristics compared to other photoresists on the market. The high resolution of the photoresist unit is a result of its unique properties. At the heart of FISA CC20/40 photoresist machine is the cobalt-based radiation-sensitive compound, which is designed to be sensitive to light waves between 270 and 460 nanometers. This wavelength range has been found to allow for more accurate, high resolution lithography processes. The cobalt-based compound also allows for improved photo-stability and faster development times than other photoresist systems. The photoresist tool is also formulated with a liquid developer that contains a combination of acids and complexing agents that have been specifically designed to improve resource development and performance. This developer is designed to more easily remove the exposed photoresist from the substrate, producing higher resolution patterns. The developer also helps reduce environmental and health hazards since it is non-toxic and water-based. The photoresist asset is also designed with a low-temperature curing process, which enables stronger films to be produced without the expensive etch and pattern transfer steps required for some photoresists. Low temperature curing also has the added benefit of reducing the photoresist model's sensitivity to thermal shock and enables very precise pattern transfer into the substrate. Finally, the photoresist equipment is designed with an optimized reflow curve, an important feature for successful lithography processes. The reflow curve is tailored to the specific application and helps ensure consistent line edge and pattern fidelity. By combining the unique properties of its cobalt-based radiation-sensitive compound, optimized liquid developer, low-temperature curing process, and refined reflow curve, FISA CC20/40 photoresist system provides superior resolution, greater photo-stability, reduced costs, and environmental and health benefits compared to other photoresist systems on the market. This makes FISA CC20/40 photoresist unit a great choice for use in lithography and dry film processes.