Used FLUOROCARBON Mini Classic B #293604257 for sale

ID: 293604257
Spin Rinse Dryer (SRD).
FLUOROCARBON Mini Classic B is a photoresist equipment used widely in the electronic and semiconductor industries. This system uses a dry film resist to create patterns on wafer surfaces. This dry film resists is a radiation sensitive polymer that changes its property when exposed to a light source. This exposes areas of the film to an etching solution, and the higher-exposed areas are easily etched away. Mini Classic B is a particularly high-performance unit because the exposed areas are unaffected by the etching solution and are incredibly easy to remove. This means that patterns can be etched quickly and with great precision. FLUOROCARBON Mini Classic B is also very versatile, as it can be used for both single-layer and multilayer patterning and etching. The machine comes with an advanced Neas 2.0 auto-correction software, which ensures that the film is correctly applied to the wafer surface. This ensures that the etching process is accurate and efficient. The software also enables the tool to accurately detect any changes in the film's thickness or other properties. Mini Classic B is extremely durable and can be used for the fabrication of a wide range of products including multi-layer interconnection substrates, rigid board substrates, and flex and rigid-flex boards. The asset has a maximum resolution of 0.1 micron and can be used with a variety of etching chemicals, ensuring that it can be used with a wide range of wafers and substrates. The model is also incredibly easy to use, enabling users to quickly receive quality results. The equipment includes accessories such as a three-dimensional thickness detection stage, a blade module, and a spinner station, which ensures the consistency and accuracy of the system. In summary, FLUOROCARBON Mini Classic B is an advanced photoresist unit designed for heavy usage in the electronic and semiconductor industries. It features an advanced Neas 2.0 auto-correction software, as well as a maximum resolution of 0.1 micron and a variety of etching chemicals, allowing for fast and accurate patterning and etching on a wide range of materials. The machine is also easy to use, with a variety of accessories that ensure consistent and accurate results.
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