Used FSI EXCALIBUR #293818919 for sale

FSI EXCALIBUR is a photoresist equipment designed for use in electronic circuit fabrication processes. It is composed of a photoresist exposure machine and photoresist processing station. In photolithography, a photoresist layer is used to transfer circuit patterns from a mask onto a semiconductor wafer. The photoresist is a light-sensitive material, so in order to produce the desired result, light must be accurately directed onto the photoresist layer. EXCALIBUR is a system designed for this purpose, delivering the accurate exposure necessary for a high-quality circuit pattern. It is capable of projecting an image onto a photoresist layer with a resolution of up to 2,048 microns in size. This makes it possible to achieve the production of extremely tiny features, down to the submicron range. It features an advanced direct imaging exposure route comprising of a triplet microscope objective and mirrors. This delivers a continuous, homogeneous exposure of the photoresist layer, allowing for the integration of photolithography in submicron designs. FSI EXCALIBUR offers a wide range of features and functions, including an auto alignment unit, which ensures the optimal placement of the wafer on the exposure machine. It also offers integrated tracing, pre-alignment, post-alignment, and overlay mapping. This allows for pre-matching of each layer of the pattern and is especially suited for high-volume, large-scale processes. In addition, EXCALIBUR machine comes with a photoresist processing station, which is used to carefully process the photoresist after it has been exposed. It offers an automated, tunable photoresist processing algorithm that is designed to reduce processing time and cost, while maximizing circuit yield. The station also has integrated thermal and vacuum control systems, as well as a dynamic mask detection tool, which ensures that each layer has been consistently exposed. FSI EXCALIBUR is ideal for precision circuit design and multi-layer production, allowing for the fine-tuning and control of circuit characteristics in order to achieve the highest quality results. It is an excellent choice for fabrication operators, as it facilitates an efficient and reliable photolithography process, helping to reduce time and costs and maximize yields.