Used FSI SATURN OC #293592650 for sale

FSI SATURN OC is a pioneering 193 nanometer (nm) exposure tool for dry resist development, chemically amplified photoresist, and resist edge profile optimization. SATURN OC enables original equipment manufacturers (OEMs) to provide chip designers with the capability to progress lithographic tool performance beyond the theoretical diffraction limit, while providing unparalleled repeatability. FSI SATURN OC features an integrated 6" exposure field, providing exposure field sizes of 6.5", 5.5", 4.5", and custom configurable line / space patterns. The exposure field provides sub-angstrom line widths and repeatable edge-to-edge uniformity for both dye and chemical amplification resist. SATURN OC has optical system performance advantages. The energy control and homogeneity of exposure enable sub-angstrom line widths for dense patterning. The innovative optical optimization tools enable rapid edge contrast optimization for CHA resists and improved contrast, pitch and window patterns for dye. FSI SATURN OC has an in-situ monitor for accurate dose and focus monitoring, which active optical monitor guaranties aggressive process conditions to enable aggressive RECOnnode-level overlay accuracy. The lithographic process matching is consistent with that of the existing 193nm manufacturing fabrics, and the optical performance is extremely repeatable. SATURN OC's chamber design also minimizes photoresist standing wave effects and non uniformities. FSI SATURN OC is a powerful new tool for chip design and processes that feature aggressive device scaling and break the limits of diffraction lithography. SATURN OC system's advanced features guarantee ultra-stable overcoat procedures and nanometer-level repeatability while providing enhanced optical performance. With its excellent optical system reliability and integrated testing and optimization capabilities, FSI SATURN OC makes it an ideal choice for OEMs and semiconductor manufacturers.