Used FSI / TEL / TOKYO ELECTRON 915597-005 #9360974 for sale

ID: 9360974
Wafer Size: 12"
Turntable for Zeta 300, 12".
FSI / TEL / TOKYO ELECTRON 915597-005 is a photoresist equipment designed to provide precision etching for wafer processing in integrated circuit (IC) manufacture. This system is based upon a beam driving unit of spaced, independent lamp chamber arrays. The machine uses advanced patented technology such as Intelligent Auto Level (IAL), Automatic Exposure Output (AEO), and High Resolution Machine (HRS). The IAL tool applies a measurement of the optical density of photoresist layers and is then able to match the reaction of layout patterns for IC devices to the most suitable exposure condition. The IAL offers reliable step and repeat lithography along with adjustments to any environmental conditions, to ensure stability during ultra-high resolution patterns, even if there are some light level differences. The AEO asset ensures reliable performance when transferring complicated patterns to the photoresist. It provides a precise control and duration of light exposure during illumination and transfers it to IC designs. To ensure accuracy, this machine also takes into account factors such as the amount of the light light intensity, the width of the exposure range, and the uniformity of the light along the processing area. The HRS feature improves photoresist processing accuracy, enabling ultra-high resolution layout patterns to be created. Its design combines digital control and signal processing to correct any irregularity that could occur with high speed exposure in order to maintain the highest level of precision. This ensures that projections and patterns can be accurately replicated during etching, preventing any loss of quality. FSI 915597-005 photoresist model has been designed to provide high-performance results with accuracy levels that meet the best industry standards. Its combination of Intelligent Auto Level, Automatic Exposure Output, and High Resolution Equipment make it an ideal solution for creating realistic designs and etching patterns in integrated circuit manufacture.
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