Used FSI / TEL / TOKYO ELECTRON 915597-005 #9408657 for sale

FSI / TEL / TOKYO ELECTRON 915597-005 is a Photoresist Equipment designed for photo-mask patterning applications. It consists of a Stepper/Aligner Model 915597 and an Exposure Unit Model 915596. The Stepper/Aligner is a high accuracy, high-speed patterning system for fine-line, high density 3-dimensional imaging on large size photomasks up to 12.7 x 12.7 inches (320mm x 320mm). It features a large field size, with X/Y coordinates up to +-9.8 inches each, and has a maximum speed of 4000 x 4000um/sec. The Exposure Unit of the unit provides up to 3 EV and enables accurate exposure of the photomask by linear, split and jumping multilayer patterning. It offers advanced performance for inline reticle processing with a 6-inch DUV lamp, enhanced calibration and measurement functions, and advanced pattern verification for precise pattern transfer accuracy. This machine is equipped with fully automatic wet and dry processes combined with high-speed scanning and advanced software features for increased throughput, flexibility and ease of use. This tool is especially suited for the production environment, providing process control with tight uniformity and precise overlay accuracy. It is also capable of performing simultaneous exposure of 8-inch photomasks. The combination of the Stepper/Aligner and Exposure Unit offers improved output for imaging with tight line widths and minimum critical dimensions. This asset is also equipped with a coil lens mounted on the Stepper/Aligner which provides high numerical aperture (NA) imaging and low distortion. Overall, FSI 915597-005 Photoresist Model is designed to provide industry leading accuracy, resolution, throughput and repeatability for the photo mask-patterning process. It offers repeatable, cost-effective and efficient imaging throughout the entire production process. This equipment is designed to meet the requirements of a wide range of customers including semiconductor, microelectronics, mask production and research and development labs.