Used FSI / TEL / TOKYO ELECTRON 918331-002 #293665158 for sale

FSI / TEL / TOKYO ELECTRON 918331-002 is a photoresist equipment designed for high-precision atmospheric processing. The system's plasma-based technology helps achieve optimal levels of cleaning while avoiding contamination. This photoresist unit is capable of performing advanced RIE (Reactive Ion Etching) that can efficiently remove photoresist and other related material. Its simple operating machine is highly user-friendly and facilitates monitoring of the operational parameters. Its high-end design results in uniform etching with precise control over the physical properties of the materials, such as width and thickness uniformity as well as aspect ratio control. It also offers variable pressure range and an improved vacuum environment. Inside the chamber, the pressure is brought down to two atmospheric levels. Its high frequency RF generator allows electrical energy to be transmitted to the chamber. This technology is compatible with inert gas like argon or nitrogen for plasma synthesis. The advanced wave management control provides the power necessary for a stable plasma. The photoresist tool can be operated with up to two wafers, with consistently uniform etching. The etching process is precise and uniform. It can be operated from low power to cycles of high voltage to achieve different etching effects. Its high degree of control over the voltage ensures that the etching is done with minimal variance. The asset's design is highly efficient and offers a full monitoring feature to help operators. Its variable pressure range allows more flexibility to reduce pressure when needed, and to increase it when required for different etching requirements. This model is also equipped with motion control mechanisms that help optimize maintenance and deliver better performance. The unique design of FSI 918331-002 photoresist equipment is an ideal choice for a range of advanced etching processes. Its excellent performance, efficiency, and user-friendly system make it an ideal solution for a variety of etching needs.