Used FSI / TEL / TOKYO ELECTRON / DESPATCH CT200 #9355258 for sale

FSI / TEL / TOKYO ELECTRON / DESPATCH CT200 Photoresist Equipment is a photochemical processing system primarily used for precision process control during the manufacture of silicon wafers. It is designed for the integration of photoresist processing steps into a single unit for superior performance. The machine uses photoresist technology to deposit photosensitive chemicals onto a substrate, which is then exposed to light sources to create a pattern in the coating. This pattern can then be developed, etched, or cleaned, as required for the final device. FSI CT200 features a unique two-chamber tool for maximum precision control of process parameters. The process chamber is used to carry out the photoresist process, while the transfer chamber is used to move substrates between chambers without contamination. The asset is capable of depositing and exposing photoresist films to wavelengths ranging from ultraviolet to infrared. The model is equipped with a sensors to monitor process temperatures and pressure, allowing for accurate and repeatable results. The equipment is also equipped with a data logger to provide a permanent record of process data. The photoresist system can be used to deposit and expose photosensitive films with high precision, making it well-suited for use in a wide range of semiconductor processes, including semiconductor device fabrication, lithography, photolithography, resist oxidation, and advanced packaging. The unit also features a computer control machine that can generate recipes for specific processes, allowing for improved quality assurance and higher throughput. The software package is capable of managing process parameters, monitoring process temperatures in real-time, setting alarms, and logging data. TEL CT200 photoresist tool is an excellent choice for semiconductor manufacturers looking to produce high-precision devices in an efficient manner. The asset's high precision, repeatability, and automated control capabilities make it suitable for use in a variety of process applications.