Used FSI / TEL / TOKYO ELECTRON / DESPATCH CT200 #9355259 for sale

FSI / TEL / TOKYO ELECTRON / DESPATCH CT200 is a high-performance, precision-engineered photoresist equipment. This system is designed to meet the advanced photolithography requirements of various semiconductor markets and provides an ultra-precision chemical processing platform for the manufacture of even the most sophisticated semiconductor components. FSI CT200 utilizes a variety of proprietary technologies to generate vacuum fan-in or spin-on photoresist patterns. This unit combines a contactless direct-write method with a micro-fabrication technology, allowing the user to create intricate and extremely detailed features even on the nanometer level. The machine features a highly-sophisticated robotics control tool, which guides all process components, along with a variety of software settings that can be tailored to different applications. TEL CT200 uses a high-resolution image scanner and a high-speed pattern movement asset to enable ultra-precise pattern writing on resists at a maximum resolution of 10um. User-programmable focus and exposure settings can be adapted to match the specific requirements for each application. The model is also capable of printing continuous or segmented patterns. CT200 incorporates a vacuum framer to pre-treat substrates and manages the placement and alignment processes. It can process up to 4" substrates at once with an optical depth of 1.5. The equipment allows for a standard exposure time of 20 milliseconds and is capable of printing up to 2,000 images per hour. DESPATCH CT200 is designed to meet the stringent requirements of a variety of semiconductor production processes. The superior performance and precise control makes this system an excellent choice for complex photolithography applications.