Used FSI / TEL / TOKYO ELECTRON Excalibur #293642294 for sale

FSI / TEL / TOKYO ELECTRON Excalibur Photoresist equipment is a high-performance automated photolithography solution which was developed to address the challenges of sub-100nm fabrication using photolithography. It is designed to deliver precision, high throughput and low-cost processing and adapted to a wide variety of complex applications including WLCSP, photonic WaveGuide, SiGN PV cell patterning and MEMS processes. FSI Excalibur Photoresist system is based on a proprietary lithography technology developed by FSI, with a patented fine-tuned photo-resist unit for intricate patterns. Built on a modular platform, TEL Excalibur machine is designed to achieve high accuracy, reliability and repeatability. The tool utilizes a high power light source (HPLS) which enables the asset to focus light on substrates with up to 25 - 100 nm accuracy, allowing for faster and more accurate results. The light source is multi-wavelength capable, allowing users to switch between different wavelength bands to achieve optimal patterns. The model also utilizes an advanced CCD camera that can detect and analyze fast-moving targets, and is capable of tracking particles and balls with high accuracy. This enables resolution and accuracy up to 20 nanometers at an efficient throughput of up to 200 wafers per hour. TOKYO ELECTRON Excalibur Photoresist equipment utilizes a highly efficient cleaning station which was specifically designed to remove unwanted particles and contaminants from the wafers. This cleaning process is critical for ensuring the success of the photolithography process and the final desired products. The system is designed for versatile application and its modular architecture allows for upgrades and enhancements. It comes with a range of sophisticated software tools and features like profile optimization tools, automatic pre/post optimization, alignment features, overlay and residual fidelity analysis tools, and defect detection algorithms which can help optimize performance. Excalibur Photoresist unit has been used for the high precision photolithography and advanced microstructuring of a broad range of materials from conductive polymers, glass, III-V compounds and ceramics. It can also be used for maskless lithography, enabling general purpose manipulations at the substrate level. This machine is renowned for its high accuracy and repeatability and is capable of handling a wide range of substrates and production volumes.