Used FSI / TEL / TOKYO ELECTRON EXCALIBUR #9137323 for sale

FSI / TEL / TOKYO ELECTRON EXCALIBUR is a photoresist equipment designed to create high precision images with resolution up to 100nm. It is capable of producing fast, high resolution images in both digital and analogue format. The system is composed of four main components: an exposure unit, a motorized stage, a chamber, and a photoresist unit. The exposure machine includes an illumination source for directing diffracted light on the substrate, dithering motors for creating uniform illumination, shutters for controlling the intensity of light, and optical lenses for focusing the beam. The motorized stage is responsible for moving the substrate around the chamber in order to locate exposed areas. The chamber serves to create the vacuum that allows high level of accuracy when processing the substrate. The photoresist unit provides the correct chemical composition of the photoresists used in the application of the different layers of the images. The tool works by placing the substrate onto the motorized stage and moving the substrate under the illumination source to the different points on the chip that need to be exposed. By controlling the exposure source, the image area is illuminated and the chemicals in the photoresist are activated. The substrate is then moved to the next point and the same procedure is repeated. The chemicals in the photoresist react on the light from the exposure source, creating a layer on the substrate which later becomes the image. Once the process is finished, the substrate is then moved to the chamber for developing, which includes the machines for spinning and rinsing the substrate with the necessary chemicals. This helps to wash away the excess photoresist, leaving behind a clean and high resolution image. FSI EXCALIBUR asset is suitable for use in the advanced photolithography processes for creating high precision and high quality images in both digital and analog formats. It makes use of the advanced motorized stage capabilities to maximize the accuracy of the images and ensures that the output is of the highest possible quality. It is also capable of processing substrates quickly, allowing the production of large volumes in a short period of time. The model is designed to provide users with a dependable and high performance photoresist solution.