Used FSI / TEL / TOKYO ELECTRON HELIOS 52 #187971 for sale

FSI / TEL / TOKYO ELECTRON HELIOS 52 is a photoresist process control equipment, designed for use in semiconductor wafer photolithography. The system is capable of accurately measuring the reflectivity and other resist characteristics of the resist film, in order to ensure that the resist pattern can be accurately reproduced in further stages of the microfabrication process. It is an automated unit, capable of monitoring the wafer reflectivity and other resist characteristics in real time, enabling repeatability and precision across processes. The machine consists of a 10X Microscope, equipped with a focus stepping mechanism, Galvo Stage, and sensored wafer. The microscope is used to measure the optical reflectivity of the resist film, enabling the tool to identify and compensate for any irregularities. The Galvo Stage allows multiple points to be measured on the wafer, providing an unbiased approach to finding the best center of the pattern. The sensored wafer is covered with anti-reflective coating, ensuring the results are as precise as possible. The asset incorporates a data acquisition model, designed for storing, analyzing, and reporting the data collected during the process. This enables the equipment to compare the results of each process to the pre-determined values, and adjust the process as needed for further optimization. This system also allows for the automation of process adjustments, allowing for the unit to quickly adjust to a variety of process conditions. Additionally, the machine allows for remote access, allowing for remote diagnostics and troubleshooting. Furthermore, FSI HELIOS 52 tool features an advanced software interface. This interface allows for the easy setup and control of the photolithography processes, simplifying what can otherwise be a complex task. The software also includes a graphical user interface, enabling the user to view both the process and results in a visual manner. This makes it easier for users to monitor the progress and identify any issues, quickly and accurately. Overall, TEL HELIOS 52 photoresist asset is an advanced process control model, capable of quickly and accurately measuring resist characteristics. Its advanced software interface provides an easy setup and control of the photolithography process, ensuring that the results are precise and repeatable. With its data acquisition and remote access capabilities, it makes it possible to apply adjustments and monitor the progress of the process, quickly and accurately.