Used FSI / TEL / TOKYO ELECTRON HELIOS 52 #293640333 for sale

ID: 293640333
Wafer Size: 6"
DI water heater, 6".
FSI / TEL / TOKYO ELECTRON HELIOS 52 is a photoresist equipment used for lithography in the semiconductor industry. It is used for developing and exposing photoresist materials and insulating films. The machine offers accurate and reliable imaging and resists that are necessary for any contemporary design requirement. FSI HELIOS 52 employs a high-performance multiple imaging stage which ensures stable optical performance and offers a wide range of imaging accuracy for an improved manufacturing process. The system consists of two motors, a stepper motor and a galvanometer mirror. The precision stepper motor controls fine in-line displacements while the galvanometer controls quick in-plane movements. The optics range consists of a 5x objective lens to achieve a high-resolution imaging of up to 1.15 micron across a 1 inch wafer. A dedicated low distortion mirror cage can be used to achieve a higher level of accuracy. TEL HELIOS 52 also features a temperature-controlled humidity chamber that is designed to maintain the resist temperature, humidity and exposure conditions at a constant level, which is especially important for photolithography operations. It also includes a scanner position detector for finer positioning and alignment of the imaging plane. The machine uses a dry-pole, 2-component chemical-process unit to etch the photoresist material followed by a rinse of the photoresist material to remove processing residues. This machine is specifically designed for processes that require high overlay accuracy and short throughput times. It is also equipped with an automated resist-processing cassette, dry-film-developer cassette, and exposure cassette to reduce downtime and load time. HELIOS 52 is capable of reliable exposure of different patterns with high throughput, accuracy and yield by continuously controlling film uniformity. The cutting-edge photolithography machine is designed for semiconductor industries and is suitable for leading-edge device production. Its features make it an excellent choice for those seeking an effective, reliable and precision imaging tool.
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