Used FSI / TEL / TOKYO ELECTRON HELIOS 52 #9160994 for sale

FSI HELIOS 52 is a photoresist equipment designed for use in the production of advanced circuit boards, semiconductor wafers, and other electronic components. The system uses a special chemical compound to etch patterns onto semiconductor materials like silicon and gallium arsenide. It produces incredibly precise etchings that allow for high-resolution images to be produced. The unit works by creating a base polymer film coating on the semiconductor surface, which is then exposed to a light beam emitted by a laser or flash lamp. As the light passes through the UV-sensitive polymer, it transposes the patterns of the image onto the polymer surface. Once exposed, the chemically reactive compound in the photoresist machine etches the desired image onto the semiconductor material. HELIOS 52 photoresist tool offers several advantages. Its small size offers convenience and portability for applications requiring mobile operations. It also requires no additional power sources, as the UV light emitted is generated within the asset itself. Additionally, the light is recyclable so no additional material is needed to conduct the etching process. Finally, its low-maintenance design makes it simple to use and maintain. FSI HELIOS 52 also incorporates advanced features for enhanced accuracy and repeatability. Advanced camera-vision calibration capabilities let users adjust the exposure irradiance and dose with pinpoint accuracy. The model is able to generate images with resolution ranges from 0.6 to 20 μm, perfect for any application needing high detail in etching patterns. Finally, the equipment can be programmed to etch multiple images in a single pass, making it incredibly efficient and productive. Overall, HELIOS 52 is ideal for those needing high-resolution etching patterns for electronics applications. Its small size, simple operation, and high-quality images make it a great choice for anyone looking to upgrade their fabrication capabilities.