Used FSI / TEL / TOKYO ELECTRON K100 #9099908 for sale

FSI / TEL / TOKYO ELECTRON K100 is a photoresist equipment developed by FSI, Ltd., that uses advanced exposure and imaging technologies to perform a broad range of precision photolithography processes. The system is designed for use in IC manufacturing applications, including advanced 3D interconnects, microelectromechanical systems (MEMS), photo-imaging and other high-precision tasks. FSI K100 unit consists of three major components: the exposure machine, the exposure controllers, and the imaging tool. The exposure asset is used to deliver exact amounts of super-fine exposure radiation to specific areas on the substrate. Mounted on a micrometer manipulator, the exposure model is capable of very precise and accurate control of the exposure parameters. Additionally, the exposure equipment includes a large field of view (FOV) that is adjustable to fit the substrate shape, allowing extremely precise image registration. The exposure controllers consist of a series of advanced image processing algorithms that are used for controlling the exposure process. These algorithms are designed to optimize the exposure settings to ensure high quality results with minimal wattage usage. Additionally, the exposure controllers are designed to work in tandem with the imaging system to help ensure accuracy and faster throughput. The imaging unit is designed to detect ultra-high resolution images with pixel response times in nanoseconds. This allows very fine features to be detected with minimal image distortion. Additionally, the imaging machine includes a clean imaging method that is used to avoid image artifacts from overlapping features. TEL K100's photoresist tool is designed to provide highly accurate and reproducible lithography processes. This includes alignment and imager processing of the images that produces high resolution images at the speeds necessary for efficient and economical manufacturing. Additionally, K100 asset is capable of working with a wide range of substrates, including polyimide, silicon, and glass, allowing it to be very versatile and suitable for many different applications. Overall, TOKYO ELECTRON K100 photoresist model is a very advanced equipment for lithography and its advanced components allow for precise and accurate control of the exposure parameters while minimizing energy usage. The system is well designed for use in IC manufacturing applications and its advanced imaging unit allows for detection of ultra-high resolution images with minimal image distortion. FSI / TEL / TOKYO ELECTRON K100 photoresist machine provides excellent results and is well suited for various types of substrate materials.