Used FSI / TEL / TOKYO ELECTRON Lithius Pro V-i #9358787 for sale

FSI / TEL / TOKYO ELECTRON Lithius Pro V-i is a photoresist equipment designed for high precision patterning applications. The system enables embossing of micro-structures onto a substrate with sub-micron resolution. The integrated unit includes a plasma-enhanced chemical vapor deposition chamber (PECVD), a spin-coater, and an exposure head for optimizing process steps for product applications. The PECVD chamber is used to deposit photolithography-grade photoresist coatings on substrates such as silicon wafers, sapphire wafers, and ceramic substrates. The spin-coater is used for optimizing the uniform dispersion of the resist coating on the substrate to ensure a smooth and even coating. The exposure head uses both "step-and-repeat" and "step-and-scan" capabilities to deliver high resolution (less than 1 micron) photomask patterns onto the coated substrate. This highly sensitive machine is able to resolve features smaller than 0.25 micron while ensuring uniformity across wide areas. In addition to the spin-coater and exposure head, the tool also includes an automated track and tooling asset, which allows for fast changeovers on the process line. The software integrated in the model provides users with access to image data and advanced pattern recognition capabilities. This feature enables the equipment to identify photoresist patterns on photomasks and accurately transfer them onto the coated substrate. FSI Lithius Pro V-i photoresist system is easy to set up and use, with industry-leading design, safety, and process automation features. All components of the unit are of the highest quality, ensuring reliable and consistent results. Its precision, speed, scalability, flexibility, and low costs make it an ideal machine for the most demanding photolithography applications.