Used FSI / TEL / TOKYO ELECTRON Mercury MP #293587873 for sale
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ID: 293587873
Spray cleaning system
PFA Turntable, 8"
(2) Canister consoles:
Console 1: H2SO4, HCL, Dilute HF
Console 2: H2O2, NH4OH
Frame
Valves
Tube
Canisters
Spray post
Flow meters:
Gas / SCCM
H2SO4 / 200-2000 SCCM
HCL / 20-500 SCCM
Dilute HF / 100-2000 SCCM
H2O2 / 20-500 SCCM
NH4OH / 20-500 SCCM
DI Mix / 200-2500 SCCM
(2) Drains: N/O, N/C, drain valves
Dual exhaust
Control system with touchscreen, 15"
FSI Helios 52 DI Water heater with touchscreen, 5"
IR Heater
Operating system: Windows 10 IoT.
FSI / TEL / TOKYO ELECTRON Mercury MP is a top-of-the-line photoresist equipment designed to create photomasks used in the production of semiconductor devices. FSI Mercury MP employs advanced laser lithography techniques to perform sophisticated process manipulation and precise exposure control, enabling the production of photomasks with extremely high resolution. TEL Mercury MP utilizes native SEMI exposure and metrology standards, ensuring dependable performance and the production of photomasks with the highest possible quality. The system is designed for reliability and ease of operation, featuring an ergonomic operator console and graphical user interface that enable rapid setup and operation. TOKYO ELECTRON Mercury MP employs two or three exposure lasers for dual exposure capability and enhanced exposure control. The unit has an HDTV alignment machine with overlay capability, ensuring accurate alignment of each photomask step. This tool also provides a non-contact metrology capability, which allows the calibration of imaging parameters and the inspection of patterns. In addition, Mercury MP features an advanced beam diagnostics asset which provides highly detailed measurements of laser beam performance. This model improves yield by enabling the correction of imaging aberrations and other variables associated with laser exposure. FSI / TEL / TOKYO ELECTRON Mercury MP has unprecedented focus and depth of field, allowing it to create fine patterns over much larger areas than traditional lithography systems. This enables the fast and reliable production of extremely large-scale and complex photomasks. FSI Mercury MP is the pacesetter for photoresist systems. Its combination of cutting edge laser lithography technology and precise control allows the highest quality photomasks in the most efficient manner. This makes TEL Mercury MP an ideal choice for any application requiring the production of precisely controlled photomasks.
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