Used FSI / TEL / TOKYO ELECTRON Mercury MP #9090432 for sale

FSI / TEL / TOKYO ELECTRON Mercury MP Photoresist equipment is a type of high velocity physical vapor deposition (PVD) system used for the deposition of photoresist layers on the surface of semiconductor wafers or other materials in the fabrication of integrated circuits. This unit includes a Mercuryｮ MP PVD processor and a Microprocessor based controller, which allows rapid and precise deposition of the photoresist. The machine is equipped with a special high speed atomization process and a special gas atomization nozzle which can generate an extremely fine spray of the photoresist material. The nozzle is capable of controlling the size of the atomized particles and providing consistent particle size distribution. Also, this tool features fast tuning time and improved deposition uniformity, making it ideal for high volume production. FSI Mercury MP Photoresist Asset also provides flexibility and enhance process control by allowing for multiple recipes for different process applications and allowing adjustment of the parameters to optimize the deposition layer according to the specific needs. The model is capable of producing ultra-thin layers of high quality photoresist and can deposit material at varying thicknesses with good uniformity. This equipment can achieve fast deposition rates of up to 1 micron/second, which is much faster than traditional resist processes. TEL Mercury MP Photoresist system can be integrated with other processes such as etching and cleaning, allowing for fast and efficient production of semiconductor devices in high volume production. This unit has an integrated vacuum machine which is capable of providing high-vacuum conditions, which are necessary for the optimal deposition of photoresist. This tool also includes a special nozzle whose design ensures optimum particle size and uniformity throughout the deposition process. Moreover, it offers an automatic process control asset which can be customized according to the customer's requirements. In addition, TOKYO ELECTRON Mercury MP Photoresist Model is designed to be highly reliable and offer a long life cycle. This equipment is well-suited for both batch and inline processing. It also offers exceptional resistivity for a wide range of applications, including image reversal and image intensification. Furthermore, this system is easy to use and can be used in a variety of systems including sputtering, spray pyrolysis, and chemical-vapor deposition. In conclusion, Mercury MP Photoresist unit is a great choice for semiconductor device manufacturing due to its fast deposition rates and improved process control.