Used FSI / TEL / TOKYO ELECTRON Mercury MP #9122700 for sale

FSI MERCURY MP is a highly advanced photoresist equipment designed to provide superior results in photolithography processes. It is specifically tailored for micro-electromechanical systems (MEMS) and microcircuits applications. The symbiotic combination of the desirable properties of liquid- and dry-film photoresists, enabled by a highly efficient film coating and exposure process, allows the system to offer state-of-the-art product performance for MEMS and microcircuit applications. MERCURY MP photoresist unit uses a unique liquid resist and dry resist combination to provide superior resolution, adhesion, and etch resistance. The liquid resist is applied to the substrate and then dried with ultraviolet light. This provides a uniform, well-defined pattern with excellent feature definition and significantly lower undercut than a typical liquid photoresist. The resist pattern is transferred to the underlying substrate layer by exposing it to ultraviolet light. The exposure process activates an efficient photochemistry, which ablates the unprotected surface areas and provides a sharp, clear line pattern. The dry resist is then applied over the exposed liquid resist layer. It provides additional etch resistance, allowing for better dimensional control. The dry resist also has additional layer adhesion aiding in the overall adhesion performance of the resist stack. By utilizing a combination of liquid- and dry-film photoresists, FSI MERCURY MP provides customers with a solution that offers both enhanced resolution and increased etch resistance properties. MERCURY MP machine features a highly efficient film coating and exposure process that is tailored for MEMS and microcircuit applications. It utilizes patented highly coherent products and technology to ensure optimal results with low contamination and no image distortion. The highly efficient exposure process allows the full use of a surface area with controlled substrate expansion, resulting in improved line width and critical dimension control. The exposure process is optimized for patterning a range of materials, including silicon, silicone and other materials. FSI MERCURY MP tool offers a variety of standard photoresist formats, enabling customers to get the best performance for their application needs. From large area applications to detailed device fabrication, the asset is designed to provide performance and reliability. With its easy user interface and robust process, MERCURY MP is the ideal model choice for MEMS and microcircuit production, offering quality, reliability and cost-efficiency.