Used FSI MERCURY MP #9189482 for sale

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FSI MERCURY MP
Sold
Manufacturer
FSI
Model
MERCURY MP
ID: 9189482
Wafer Size: 6"
Vintage: 1997
Spray cleaning system, 6" 0106 Generation system (5) Chemicals 4-Position PFA table CE Marked 1997 vintage.
FSI MERCURY MP is a photoresist equipment that provides unmatched high-definition lithography capabilities for creating micro-scale and nano-scale patterns on semiconductors, MEMS, and other precision components. MERCURY MP is designed to provide users with high resolution and accurate results while giving the highest throughput and stability on the market, ultimately leading to superior yield and cost savings. FSI MERCURY MP utilizes a unique optical imaging system that includes a special maskless scanning technology which projects an image from a digital single-layer mask onto a wafer without the need for photomask fabrication. This maskless scanning unit preserves the highest resolution being achievable due to its precise alignment accuracy and reproducibility. Additionally, MERCURY MP employs advanced on-site metrology capabilities to precisely measure patterns and control overlay accuracy. The machine also features an advanced liquid cooling tool for optimum thermal management during operation, thus ensuring the highest image stability and uniformity on the market. FSI MERCURY MP also uses a proprietary robotic approach for coating and stripping operations, automating the photoresist processing workflow from spin coating to imaging and stripping, with minimal intervention. The robotic solution helps improve the asset's throughput and process consistency, as well as reduce photoresist consumption. Although MERCURY MP is designed for industrial production, its sophisticated design allows it to be used for research and development purposes as well. Its ability to switch between a selection of advanced reticles helps it accommodate complex process requirements, and the model can be expanded and reconfigured to integrate additional tools and reticles. To sum up, FSI MERCURY MP is a powerful and efficient equipment that offers unrivalled lithography capabilities for exacting micro-scale and nano-scale patterns. The system works with exceptional accuracy and precision and offers the highest throughput and image uniformity, as well as advanced robotic capabilities designed to optimize efficiency and reduce photoresist consumption.
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