Used FSI / TEL / TOKYO ELECTRON Mercury MP #9217485 for sale

FSI / TEL / TOKYO ELECTRON Mercury MP is an automated photoresist equipment specifically designed for the manufacturing of semiconductor devices. This system uses the latest technology in the intense ultraviolet light curing of a photosensitive material to create a finished layer of etched material over the entire surface of the substrate. This unit is well-suited for the fabrication of high performance microelectronics, nanotechnology, and optoelectronics. FSI Mercury MP machine utilizes a patented high-resolution image projection method to deliver ultraviolet light through a desired pattern of photosensitive material. This is combined with microlithography to create nano-sized features with each cycle of image projection. The projected image is then transferred onto a substrate and cured with the high intensity ultraviolet light. This process allows for precise combinations of photolithography and laser patterning to be used for micrometer-scale features and nanometer-scale features. Allowing for much better accuracy and reproducibility than manual processes or photolithography alone. The tool includes a stepper/scanner which is used to accurately measure the ultraviolet light exposure as it passes through the mask and onto the substrate. The stepper/scanner is closely integrated with a multiple zone temperature controlled ceramic heater. This allows for accurate, repeatable, and precise curing of different materials in a single, seamless operation. As a result, the high resolution image projection, combined with the precise control of temperature and humidity, greatly enhances the production cycle time, while maintaining very high product yield. In addition to its photoresist processing capabilities, TEL Mercury MP asset enables the use of a high-vacuum tool chamber for ultrafine lithography applications. This chamber is equipped with a high-vacuum cryostat which is capable of reaching temperatures of -25°C for the rapid curing of photosensitive material. This allows for the highest possible resolution in the production of microelectronic and nanoelectronic products. Mercury MP model is designed to accommodate the processing of large substrates. It is capable of handling up to three substrates simultaneously, and the equipment provides an automated means of transferring process and substrate information between the components. This allows for greater flexibility and improved production cycle time. Overall, TOKYO ELECTRON Mercury MP photoresist system is an excellent tool for the production of advanced microelectronics and optoelectronics. The included hardware and software provide advanced technology, accuracy, and repeatability that allow for a highly productive manufacturing process.