Used FSI / TEL / TOKYO ELECTRON Mercury MP #9228777 for sale

FSI / TEL / TOKYO ELECTRON Mercury MP photoresist equipment is a highly automated and integrated system designed to enable precise handling of photoresist layers during the development, lithography, and metrology processes. Photoresist is a thin, light-sensitive polymer film used in lithography to create micro-structures on the surface of a substrate. The spline-drive stage of the unit uses linear motors that employ patented, servo-driven interpolation technology to maintain precise and accurate positional accuracy during surface registration, exposure to light, and post-development cleaning. The machine is equipped with a wide, parallel stage that allows for large photomask sizes, providing the highest resolution in a single exposure. Its advanced exposure technology enables scanning exposure patterns such as diagonal lines and arcs for high-precision etching and pattern transferring accuracy. Its precise exposure modulation achieved by semiconductor laser allows for highly precise exposures of resist pixels with precise pitch control. In addition to its exposure capabilities, FSI Mercury MP also offers a full line of metrology tools for precise substrate analysis and wafer inspections. Its metrology tool uses laser interference microscopes, confocal microscopes, and pseudo-atomic force measurements to accurately measure and detect critical size, pattern placement and shape, and device characteristics. SkyScan high-resolution inspection tools are employed to detect high-frequency features with high resolution, precision, and accuracy. Phoenix masks are used to verify the pattern shape accuracy of high resolution resist features. Data acquisition and analysis software tools are available for further analysis of the collected data. The asset also offers process simulation models to predict the pattern dimension values before committing the resist to lithography. The built-in process recipe library contains an extensive list of photolithography processes and recipes to help streamline operation and ensure reproducibility. The model has temperature-controlled chambers to support air temperature-controlled etch processes. TEL Mercury MP photoresist equipment provides a complete platform for fast, accurate and reproducible lithography and imaging results. The system's high resolution and precision, state-of-the-art metrology and inspection solutions, and extensive recipe libraries make it an ideal choice for a range of applications from semiconductor device fabrication to microfluidics.