Used FSI / TEL / TOKYO ELECTRON Mercury MP #9250089 for sale

FSI / TEL / TOKYO ELECTRON Mercury MP photoresist equipment is a lithography system designed for the fabrication of integrated circuits and microstructures. It is based on a scanned laser light exposed resist coated substrate, that is then developed with a chemical process. FSI Mercury MP unit features a wavelength of 248nm and a numerical aperture of 0.3. It is capable of automatically detecting and adjusting laser beam shape and position to ensure accurate patterns are generated on substrates. The resonator has been designed to provide further improvements in throughput and image quality, while the RLS (Reticle Level Control) machine ensures precise overlay alignment. The systems includes an advanced imaging and photomask tool that is capable of delivering pattern images down to 28nm. The asset consists of two photomasks, one for body patterning, and one for contact patterning. The photomasks are supported by an airgap imaging software that allows for intricate mask overlay alignment and photoresist process optimization. The model can be used for a variety of lithography processes, including spin coating, contact and projection printing, and exposure at the nanometer scale. It is designed for a wide range of wafer sizes, from 4 to 8 inch in diameter. In addition, the equipment's built-in temperature control unit ensures exceptional process stability. TEL Mercury MP system provides superior imaging capabilities and tight process control, as well as offering excellent photoresist uniformity. It also allows for rapid imaging and process turnaround time, reduces patterning costs, and minimizes part reworking, which makes it an ideal choice for applications where high speed, accurate imaging and efficient process control are critical.