Used FSI / TEL / TOKYO ELECTRON Mercury MP #9399075 for sale

FSI / TEL / TOKYO ELECTRON Mercury MP photoresist system is an efficient and reliable system that is used for processing wafers in the semiconductor manufacturing process. It utilizes a two-stage resist coating process to create a thin and highly uniform film of photoresist on a substrate. This film becomes the foundation for further processing on the wafer and is critical for the accuracy and reliability of the end product. FSI Mercury MP uses a standard heating stage for the wafer prior to the first resist coating. This ensures that the surface temperature is optimal for the coating process. Next, a specialized spin-spray head dispenses a uniform layer of resist across the surface of the substrate. This film is then baked within the oven to bond the resist to the substrate. The second resist coating can be performed with a second spin-spray head or a removable panel module. Depending on the type of resist used, a different baking temperature may be necessary to ensure that the resist sticks properly. After the second resist coating is completed, a layer of energy is then applied to the surface of the substrate. This energy causes the resist to react to a static charge, which creates a pattern that can be used for further processing of the wafer. TEL Mercury MP is an efficient process for the application of photoresist that produces reliable results. The system utilizes the latest technology to ensure the resist is accurately placed on the substrate and the highest quality of product is achieved. This makes the process reliable and a perfect option for the production of semiconductor components.