Used FSI / TEL / TOKYO ELECTRON Mercury OC #9015074 for sale

FSI / TEL / TOKYO ELECTRON Mercury OC photoresist equipment is a chemical coating system designed to enable precise control of ultra-thin or micron-thick layers of photoresist for photo lithography processes. This unit achieves unparalleled accuracy and repeatability by combining high-precision film coating with precise uniform resists. The machine is equipped with a precision film coating tool capable of controlling thickness of thin layers as small as 1.2nm. It also employs three unique film coating techniques: Drag Method, Jet Drop Method, and Direct Dispense Method, which increase coating accuracy and uniformity. The asset also has a precise precise uniform resist that enables reproducible resist layer thicknesses. This model is capable of creating very narrow line widths, which are essential for advanced device manufacturing processes. FSI Mercury OC photoresist equipment is equipped with a powerful software package that provides intuitive control and process monitoring capabilities. The software allows the user to define coating algorithms quickly, ensuring a shortened time-to-market for products. The software also includes an optional network connection, which provides the user with remote monitoring and control capabilities. This enables the sharing of data between different process steps as well as remote equipment diagnostics and maintenance. The system also provides integrated traceability via its compliance with industry standard protocols. This feature allows for the tracking and logging of process parameters, enabling operators to easily retrieve data, improve process data, and maintain regulatory compliance. TEL Mercury OC photoresist unit is highly reliable and resistant to deterioration. It is powerful and reliable enough to handle a variety of complex microcircuit processing applications, making it an integral part of the photo lithography process.