Used FSI / TEL / TOKYO ELECTRON Mercury OC #9220294 for sale

FSI / TEL / TOKYO ELECTRON Mercury OC is a photoresist equipment designed to perform advanced lithographic processes on a variety of substrates. Photoresist is a material that changes chemically when exposed to light. This technology is used in a number of industries including semiconductor device fabrication, printing, and medical device manufacturing. FSI Mercury OC system is an extension of FSI Venus deep-UV photoresist platform. It was developed specifically to meet the unique needs of the lithography process in sub-quarter micron IC production. This unit combines highly efficient exposed film planning technology, advanced motion control and ultra-high resolution (down to 1µm) patterning capabilities. The machine is equipped with an advanced, sophisticated wafer chuck and a reliable light source, capable of delivering very focused and consistent exposures over large areas. This ensures that the exposure process is accurate, with minimum errors and artifacts. TEL Mercury OC tool also employs a highly sensitive and reliable photomask lithography asset in order to accurately transfer complex patterns onto the resist. The model is able to accurately manipulate a variety of resist materials such as positive and negative resist, organic and inorganic resists, as well as dry- and wet-etched resists. It can also accommodate a wide range of thicknesses and illuminations, delivering precise, fine-tuned exposures. Mercury OC equipment also offers flexibility in terms of critical dimensions, allowing a wide range of critical dimensions to be achieved. This capability is critical for precise patterning, as the delivered depth of exposure and the ability to manage critical dimensions are essential for high-performance lithography processes. The technology also offers superior process control, which is achieved by using an advanced process monitoring and control mechanism, combined with a precise micro-positioning system. This ensures that the exposure process runs smoothly and achieves the desired precise patterns, at high speed and high yield. Finally, the unit is also equipped with advanced automation technology, allowing reliable, low-cost and high-volume production runs. Additionally, it is outfitted with an intuitive user interface, which makes it easy to use and requires minimal training and setup time. In conclusion, TOKYO ELECTRON Mercury OC photoresist machine is a highly advanced lithography tool that enables precise, high-yielding, low-cost production runs at high speeds. It delivers superior process control, flexibility in critical dimensions and accurate exposures, making it an invaluable tool for lithography in nearly any industry.