Used FSI / TEL / TOKYO ELECTRON Mercury #9157620 for sale

FSI / TEL / TOKYO ELECTRON Mercury
ID: 9157620
Wafer Size: 8"
Vintage: 1995
Spray cleaning system, 8" CMP, HNO3,H2O2, HF, HN4OH 1995 vintage.
FSI / TEL / TOKYO ELECTRON Mercury is a versatile, high-precision photoresist equipment designed for high-volume lithography applications. It is an all-in-one system combining advanced lithography and processing technologies, including stereoscopic lithography, scattering reduction, CD control and etching. FSI Mercury unit offers high resolution and stability for precise, high-quality processes. The machine features a proprietary scanning tool and high-resolution exposure capabilities that enable precise, high-speed exposures. It also features Turbine Computer-Aided Manufacturing (TurboCAM) software, which enables rapid layer-by-layer lithography patterns to be created. TEL Mercury also offers advanced post-exposure processing capabilities. This includes a multi-stage advance drying asset, which prevents contaminants and contaminants-derived defects. It also features a high-performance spinner for optimizing parameters such as spin speed and spin direction to achieve greater wetting coverage and an excellent homogeneous film thickness. This wide array of processing choices significantly increases productivity while providing consistent results. Mercury also offers superior tool performance. It features a high-precision autofocus model, which automatically compensates for topographical modifications, such as changes in wafer shape and surface curvature and heights. This ensures the best possible image accuracy and stability over time. The equipment also offers advanced process control capabilities, such as controlling exposure doses with high accuracy and a CD uniformity monitoring system to identify even minor non-uniformities. Overall, TOKYO ELECTRON Mercury photoresist unit is an excellent choice for high-volume lithography applications requiring high precision and stability. It offers superior tool performance, advanced post-exposure processing capabilities, and excellent control over exposure doses and CD uniformity. Its wide array of processing options allows for greater productivity and consistent results.
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