Used FSI / TEL / TOKYO ELECTRON Mercury #9187823 for sale

FSI / TEL / TOKYO ELECTRON Mercury is a photoresist equipment designed to offer the highest level of precision and reliability. This system combines the latest in lithography and imaging techniques with advanced optical unit design to enable users to pattern submicron features on a variety of substrates. It provides superior pattern accuracy, purity, and repeatability for the formation of precise V-grooves and trenches in a wide range of materials. The heart of the machine is a FSI Mercury image lamp that emits narrow-band ultraviolet light. A combination of filters then blends this light into the wavelengths that are optimum for photoresist development. The optimized light spectrum allows the resist to cure rapidly while maintaining an optimum intensity. The photoresist tool then utilizes a high-resolution, laser-scanned binary optics asset with a nine-magnification factor to expose patterns with fine detail. In addition to a repeatable alignment accuracy of ±2 µm, this model can achieve feature pitch sizes as small as 0.5 µm. The designed equipment also comes with a wafer placement stage and advanced safety features. The stage offers a tilt angle of 45° for precise patterning of contact features and excellent control of resist profiles. Additionally, an anti-reflective film is inserted between the light source and the substrate to reduce scattering, ensure satisfactory lighting even on non-ideal surfaces, and prevent the stage from overheating. Finally, a safety interlock is installed in the system to ensure that UV exposure is only initiated once the machine is in a stable and safe condition. TEL Mercury photoresist unit has proven to be extremely reliable in the production of photoresist patterns with the highest precision. It can be used to pattern ultra-small features on a variety of substrates, guaranteeing accurate and repeatable results. The combination of advanced optics, safety features, and tiltable stages also makes it an ideal choice for a wide range of photoresist applications.