Used FSI / TEL / TOKYO ELECTRON Mercury #9207178 for sale

FSI / TEL / TOKYO ELECTRON Mercury photoresist equipment is a cutting-edge resist management solution from FSI that helps to facilitate batch-to-batch and state-of-the-art photoresist processing and imaging control. FSI Mercury system offers users benefits such as improved uniformity of exposure, better control of pattern profiles, higher yield and throughput, and improved process reliability. TEL Mercury unit utilizes advanced optical sensors to measure and record the properties of the various layers of photoresist and image structures in real-time. This data is fed into a high-speed algorithm that adjusts the resist parameters (such as thickness, resistivity, etc.) according to the findings. This allows the resist to be tailored to represent the exact requirements of the customer and process. In addition, TOKYO ELECTRON Mercury machine allows users to monitor the effects of each new exposure or coating on the printing process by integrating highly sensitive data analysis tools. This allows users to identify any unexpected changes in the structure, such as thickness and resistivity, as well as overall print uniformity. The advanced automation features of Mercury tool ensures that all batches, even those with the most challenging patterns, will be processed and imaged reliably and accurately. The asset is able to control the inside-out print of fine patterns, including multi-pitch patterns, enabling efficient and accurate fine-dedicated projections. Additionally, the model calls and implements corrective measures when unexpected fluctuations are detected, ensuring that all phases of production stay within control. FSI / TEL / TOKYO ELECTRON Mercury equipment also offers users additional real-time yield simulation. This feature helps to provide detailed status and forecast corrections that can be predicted and executed immediately. This helps to ensure that the processes are optimized and any patterns are printed within the desired range. Overall, FSI Mercury photoresist system is a highly efficient, advanced product that provides users with benefits such as improved uniformity of exposure, better control of pattern profiles, and improved process reliability. The unit is ideal for thin film processes, electronic device manufacturing, flat panel display production, and other advanced photoresist applications.