Used FSI / TEL / TOKYO ELECTRON Mercury #9221786 for sale

FSI / TEL / TOKYO ELECTRON Mercury is a photoresist equipment for subtractive etching processes. This system uses a series of optical components to create uniform and precise mask patterns on the surface of a substrate. Photoresist is a photosensitive film which can be applied to the substrate and exposed to an intense light source. The light source can be either UV or visible light, depending on the type of photoresist material used. The exposed photoresist material is then developed, either with a chemical developers or a hot plate developer. The developed resist pattern is then transferred to the underlying substrate during etching. FSI Mercury is capable of producing precise three-dimensional patterning in a wide variety of materials such as silicon, quartz and metals. The unit uses a maskless stepper to accurately position the mask over the substrate. The precision of this positioning allows for extremely fine resolution patterns to be created. Furthermore, the accuracy of the stepper ensures that the resist pattern produced will be consistent and repeatable. The machine also uses a number of imaging optics including ameroid, projection and diode lasers to ensure accurate optical imaging of the substrate. This allows for a very high resolution of the wafer surface patterns produced. Furthermore, the integrated global illumination mapping ensures that all of the wafer's surfaces are exposed evenly and consistently. TEL Mercury also features a variety of process controls including temperature, pressure and chemical solutions to allow for a large number of resist development and etching processes. This range of process controls allows the user to easily configure their etching process for materials such as metal, quartz, polysilicon and ICs. Furthermore, Mercury features a range of software tools designed to simplify the etching process. These tools offer digital monitoring and control of the imaging and etching parameters, which helps to ensure that the optimal pattern is produced. Additionally, the tool includes features such as automatic resist development and the ability to save and store devise recipes for specific user requirements. Overall, TOKYO ELECTRON Mercury is a photoresist asset designed to produce precision resist patterns for various etching processes. It includes various imaging optics and process controls to help users configure the model for optimal results. Additionally, a range of software tools are offered to simplify the etching process and ensure that the resist patterns are consistent and repeatable.