Used FSI / TEL / TOKYO ELECTRON Mercury #9223674 for sale

FSI / TEL / TOKYO ELECTRON Mercury is a type of photoresist equipment used for semiconductor wafer fabrication. It is a highly accurate system that utilizes a variety of optical techniques to allow precise lithography effects when forming high-resolution patterns on wafers. The unit is engineered using leading-edge technology for mass production, making it suitable for the fabrication of economically viable devices. The machine incorporates a variety of different components and technologies. They include a scan head, which is used to control the laser spot size on the surface of the wafer; an array of short-pulse laser diodes with individual power control and frequency compensation; a model control computer for controlling the process; and a vacuum chamber. This tool also has an integrated chemical chamber with an oxygen-nitrogen gas delivery asset. All components are integrated by a triple-axis motion controller, which enables the model to accurately place laser beams over predetermined locations on the wafer. The optical properties of the photoresist equipment play an important role in accurately forming the desired patterns. A digital light mask is used in conjunction with a laser diode to create a light beam pattern on the wafer, which is then exposed to the photoresist material. The exposed material is then developed, which generates an etched pattern on the wafer based on the laser diode pattern. In addition to the optical components, the system also contains a set of chemically-assisted etching techniques. These techniques are formulated to provide a number of different options for etching different types of materials. For example, isotropic etching can be used for etching uniform or anisotropic features, while reactive ion and plasma etching can be used to create smaller, complex, and high-resolution patterns. FSI Mercury is an innovative photography tool which helps the semiconductor industry to create complex electronic components. It provides a robust, reliable, and accurate unit which is suitable for the fabrication of economically viable devices. Moreover, the machine is able to continuously improve accuracy and resolution with increasingly accurate and sophisticated techniques. This photoresist tool can generate high-resolution features in a variety of materials, resulting in shorter production time and lower cost for the semiconductor industry.