Used FSI / TEL / TOKYO ELECTRON Orion #9384177 for sale

FSI / TEL / TOKYO ELECTRON Orion
ID: 9384177
Surface preparation system.
FSI / TEL / TOKYO ELECTRON Orion is an advanced photoresist equipment designed for lithography that uses light to create patterns on a substrate. This system uses a light source such as an argon fluoride (ArF) excimer laser or a diode laser to transfer patterns onto a substrate. The transfer is made possible by the manipulation of the light's intensity. The substrate is composed of a radiation-sensitive material called photoresist, which is sensitive to certain wavelengths of light. This unit is able to create features with precise patterning and accuracy due to the control of the light intensity. The machine includes a host computer, an inert or vacuum enclosure, a photoresist coating agent, a gas flow unit, and exposure optics. The host computer runs a programmable logic control (PLC) that is dedicated to monitor the components of the tool. It is able to run patterns and recipe scripts based on the user's input and allows the user to adjust parameters in real-time. The inert or vacuum enclosure allows for the manipulation of the environment around the substrate for more precise exposure of the photoresist. The photoresist coating agent is responsible for the deposition of the photoresist onto the substrate. It is delivered via a nozzle that delivers the photoresist droplets onto the substrate. The gas flow unit is responsible for supplying an inert gas, such as nitrogen or argon, for the operation of the asset. The exposure optics part of the model contains the light source and focusing optics for controlling the intensity of the light. The equipment is capable of creating structures with dimensions as small as 0.05 microns. This system is ideal for creating micro electronic or semiconductor device components. It is also used for MEMS (microelectromechanical systems) research and development. The accuracy of the pattern formation is achieved by controlling the intensity of the light source. The user can also adjust the post exposure baking conditions to further improve the patterning of the photoresist. FSI Orion is an advanced unit capable of delivering precise patterns on a substrate for various types of lithography applications.
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