Used FSI / TEL / TOKYO ELECTRON Orion #9384180 for sale

FSI / TEL / TOKYO ELECTRON Orion
ID: 9384180
Surface preparation system.
FSI / TEL / TOKYO ELECTRON Orion is a photoresist (PR) equipment designed to enable the patterning of semiconductor circuits with higher accuracy and fidelity than ever before. This system uses lithography to transfer a pattern from a mask or reticle onto a substrate using applied light. FSI Orion unit has a wide variety of features that make it well suited for use in high-fidelity patterning for modern semiconductor applications. By utilizing dual-wavelength illumination sources, TEL Orion machine can be used to create extremely fine patterns with smaller sizes than could otherwise be achieved. The source has the capability to emit ultraviolet (UV) light and extreme ultraviolet (EUV) simultaneously, and has an adjustable photo spot size that spans from 0.7 to 10.2 μm. In addition, the tool features an optically integrated chamber and delivers substantially improved optical performance compared to traditional lithographic systems. In addition to its optical capabilities, Orion asset also has an impressive range of other technological features. This includes a proprietary high-speed shuttering model that enables a large reduction in exposure time. Additionally, it has a protective coating that shields the equipment's components from potentially damaging chemicals and highly charged particles that may be in the atmosphere. TOKYO ELECTRON Orion system utilizes advanced computing capabilities to control the finer aspects of PR. This includes controlling the exposure parameters such as dose, illumination wavelength, focus and auto focus accuracy, magnification ratio, linear and angular errors, and other details. The user interface is designed with an intuitive layout that provides an easy-to-use graphical interface for controlling the unit's parameters. Overall, FSI / TEL / TOKYO ELECTRON Orion machine is a highly advanced PR tool that offers features and capabilities that make it suitable for use in modern semiconductor applications. The combination of its dual-wavelength capability, adjustable photo spot size, protective coating, and advanced computing capabilities make it an ideal choice for those who are looking for a highly accurate and high-fidelity PR asset.
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