Used FSI / TEL / TOKYO ELECTRON PFA Turntable for Mercury MP #293808180 for sale

FSI / TEL / TOKYO ELECTRON PFA Turntable for Mercury MP is a photoresist equipment that enables users to spin thin film substrates for the application of photoresist and the etching of patterns into the surface. This innovative system is designed to enable reliable, accurate and efficient processing with high production throughput. The basic design of the unit consists of an angled radial arm for manual rotation, a planetary motor for spin speed control, and a chuck for smooth and secure holding of substrate wafers. Its 220° vertical dynamic and adjustable motion range allows for easy loading and unloading of substrates from spin cassettes. This feature is also useful for uniform thin film spin coating processes, where the arm can be adjusted to stabilize the substrate and maintain a constant rotation during the spincoating process. The PFA Turntable is built with heavy duty components engineered to last, such as anodized aluminum components, super smooth linear bearings, and durable couplings. Its reliable assembly ensures the lowest vibration, maximum tool life and accuracy. The machine also has an optional acid-resistant coating, allowing it to withstand the chemical deposition of photoresists and etching materials. The spindle rotation is controlled through a variable frequency drive that is accurate to 0.1 Hz and provides low speed range control capabilities between 100 and 20,000 RPM. The drive is also equipped with digital setpoint control with automatic acceleration and deceleration control, as well as overspeed protection for the motor and substrate. FSI PFA Turntable for Mercury MP is designed to provide reliable, efficient, and accurate photoresist processing for high-level production throughput. Its advanced design and construction, along with its motorized radial arm and adjustable motion range, allow for an optimal spin coating process, from loading to unloading substrate wafers. Its heavy-duty components and reliable assembly ensure that it can handle the toughest photoresist applications with ease.