Used FSI / TEL / TOKYO ELECTRON PFA Turntable for Mercury #293640260 for sale

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ID: 293640260
Wafer Size: 6"
6".
FSI / TEL / TOKYO ELECTRON PFA Turntable for Mercury is a photoresist equipment designed for use in a variety of materials processing applications. This photoresist system allows for the quick and repeatable deposition of thin films with high quality and repeatability in a wide range of materials. FSI PFA Turntable for Mercury uses a unique 'Lift and Push' mechanism to deposit thin films onto substrates, eliminating the need for complex manual manipulation of samples. This mechanism enables the photoresist to be applied uniformly and with high accuracy, while simultaneously controlling the thickness of the photoresist. The unit utilizes a three-channel output stage, allowing for the adjustable film thickness and deposition energy levels. In addition to the thin film deposition, the machine enables rapid batch processing of multiple samples using the same photoresist settings. This adds value to the tool and increases efficiency. TEL PFA Turntable for Mercury also tracks its processing conditions in real time and stores data for further analysis. PFA Turntable for Mercury is equipped with a mercury lamp that provides a wide range of wavelengths for irradiation and an advanced optical asset for sharp focus of the mercury beam. The choice of mercury lamp used depends on the materials being processed, allowing for the deposition of tailored thin films of improved quality and repeatability. TOKYO ELECTRON PFA Turntable for Mercury is also equipped with a vacuum model that evacuates any remaining traces of photoresist and other volatile materials from the substrate, leading to a clean, even deposition of the desired materials with no pinhole formation. In conclusion, FSI / TEL / TOKYO ELECTRON PFA Turntable for Mercury is a reliable photoresist equipment that makes short work of the task of depositing thin films. With its intuitive 'Lift and Push' mechanism, its real-time data tracking, and its mercury lamp for irradiation options, this photoresist system offers unparalleled accuracy, consistency, and repeatability, making it an excellent choice for any materials processing application.
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