Used FSI / TEL / TOKYO ELECTRON PFA Turntable for Mercury #9240895 for sale

FSI / TEL / TOKYO ELECTRON PFA Turntable for Mercury
ID: 9240895
Wafer Size: 8"
8".
FSI / TEL / TOKYO ELECTRON PFA Turntable for Mercury is a photoresist turntable equipment used to produce high quality lithographie features. It features a motorized rotating turntable, vacuum system, and gas-injection unit for aligning high-resolution patterns in photoresist. The choice of FSI PFA Turntable for Mercury from FSI series is driven by its ability to produce high-resolution patterns and its precision accuracy across the entire surface of the photoresist substrate. The turntable has a flat, non-magnetic turntable surface, which helps to ensure that there is no distortion or loss of alignment accuracy caused by magnetic forces. This helps to ensure the highest level of quality in the finished product. TEL PFA Turntable for Mercury also features a precision laser machine, which allows for high-precision alignment of the photoresist material while the table is spinning. This laser tool helps to ensure the highest levels of accuracy both during the transfer and curing process of the photoresist material. In addition, TOKYO ELECTRON PFA Turntable for Mercury also features an enclosed, temperature-controlled chamber that helps to ensure consistency of the photoresist when exposed to the environment. The gas-injection asset of PFA Turntable for Mercury is designed to inject gases into the internal chamber in order to reduce the surface contaminants on the photoresist and to provide the best substrate for the pattern to be imprinted. This is done to ensure that the most consistent results are achieved and to help prevent edge distortion. This is an invaluable process, as it can save time, money, and most importantly, help to ensure the highest levels of accuracy when producing lithographie patterns. With all of these features combined, FSI / TEL / TOKYO ELECTRON PFA Turntable for Mercury is a reliable, efficient and accurate model for producing lithographie patterns. Its ability to provide consistently high-quality patterns and credentials help to make it a staple of the photoresist market. Its efficient operation and reliability have made it a common choice among photoresist professionals and research facilities, and its overall performance has been praised by experts in the industry.
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