Used FSI / TEL / TOKYO ELECTRON PFA Turntable for Mercury #9301950 for sale

FSI / TEL / TOKYO ELECTRON PFA Turntable for Mercury is a photoresist equipment that utilizes the latest innovative technologies to provide users with high resolution imaging and excellent repeatability. This system allows for the processing of complex and delicate photoresists, including those with special features, such as patterning and a high aspect ratio. Its components include two rotating stages with encoders, motorized XY stages, two diode lasers, a microscope camera with a 4-fold TTL zoom range and planetary image analysis with maximum resolution of 5nm. The turntable's two rotating stages deliver the utmost accuracy and speed, as each can work independently of the other. The first stage is the master stage and is driven by the motor, while the second stage is controlled by the unit's encoder. This whole machine is precision tuned to ensure the highest accuracy and precision control. Moreover, the twin diode lasers allow for quick and accurate patterning of the photoresist. This allows for maximum efficiency in the treatment of the photoresist, thus enabling a higher resolution imaging. In addition, the microscope camera with 4-fold TTL zoom range provides users with exceptional imaging of minute details. This allows for the study of materials and number of processes, including thin film deposition and etching. Furthermore, the image analysis with a maximum resolution of 5nm uses a planetary method which improves the user's ability to analyse, monitor and control the critical processes and parameters. This tool is very useful for improving the yield of photoresist products and increases the reliability of the imaging. Overall, FSI PFA Turntable for Mercury is an advanced asset that employs the leading technologies to ensure superior imaging and maximum repeatability. Its two rotating stages and high resolution imaging allow for maximum efficiency in the production of photoresists. In addition, the twin diode lasers facilitate accurate patterning and the image analysis enables users to better analyse and control the photoresist processes.