Used FSI / TEL / TOKYO ELECTRON Polaris PR #9375500 for sale

FSI / TEL / TOKYO ELECTRON Polaris PR is a photoresist equipment developed by FSI International and TEL. The system is designed to enable users to achieve superior resolution for patterning and etching processes. It combines a high resolution Mask Aligner with a comprehensive wet and dry processing solution. The Mask Aligner in the unit is capable of precision patterning of micro-features with sub-micron resolution. This is accomplished through an advanced projection lithography head featuring enhanced defocusing and sub-aperture stitching. The projector also features variable stigmation and multiple autofocusing systems to ensure accuracy. The wet and dry processing solution is based on an integrated platform that combines plasma processing chambers, spin processing tools, etching tools, a substrate loader, and a user interface. The plasma processing chambers offer superior etch rates and stability of the resist layer; they also enable precise control of the etching process to achieve reduced overetch effects. The spin processing tools facilitate precise patterning of the photoresists and other materials. The etching tools enable precise removal of non-planar substrates or features. Additionally, the substrate loader provides an automated way to move substrates between different processing tools. The machine also provides precise process control with its integrated process control tool. This asset features data logging, communication with other analytical systems, and a remote monitoring tool which can be used to adjust process parameters to optimize process performance. Additionally, the model is equipped with additional features such as exposure monitoring and wafer segmentation to further improve process control. Finally, the user interface of the equipment provides intuitive operation and data visualization. It features an ergonomic design making it easy to use. It also includes an advanced report generation system for quality control processes. Overall, FSI Polaris PR is an advanced photoresist unit that is designed to enable users to achieve superior resolution for patterning and etching processes. It combines a high resolution Mask Aligner with a comprehensive wet and dry processing solution and provides precise process control with its integrated process control machine. The user interface is designed to be intuitive and ergonomic for easy operation.