Used FSI / TEL / TOKYO ELECTRON PVDF Turntable for Mercury MP #9364334 for sale

ID: 9364334
Wafer Size: 4"
4" 8-Position turntable.
FSI / TEL / TOKYO ELECTRON PVDF Turntable for Mercury MP is a photoresist equipment designed to deliver accurate and precise patterning to the manufacture of electronics. This system is based on a turbomolecular pump, providing a stable and efficient rotation of the turntable for even deposition of photoresist. In order to ensure accurate patterning of photoresist, FSI PVDF Turntable for Mercury MP includes a number of advanced features. Firstly, the components of the unit, including the mounting plate and the resist coating head, have been designed and constructed to minimize vibration and maximize dynamic stability. This ensures a smooth, consistent flow of photoresist is delivered onto the wafer surface, with minimal patterned errors and lack of coverage. TEL PVDF Turntable for Mercury MP also incorporates a precision rotary sealing machine, enabling repeatable and accurate patterning of photoresist. This sealing tool establishes a vacuum valve around the wafer, minimising contamination and masking of photoresist. Utilising the rotary components, this asset also allows for adjustment of gap spacing to suit a wide range of substrates, eliminating the need for manual adjustment of film thickness. Further, TOKYO ELECTRON PVDF Turntable for Mercury MP has an advanced software package, designed to provide a simple user interface and comprehensive data logging. This software supports the operation of a range of photo-imaging processes, including exposure, hardening, alignment and etching. This sophisticated software also allows for customised process operations and is highly responsive, with processing speeds of up to 12008w/minute of photoresist. PVDF Turntable for Mercury MP is a highly advanced photoresist model, designed specifically to meet the industrial needs of electronics manufacturers. Offering a combination of high speed, precise patterning and stable operation, this equipment is ideal for all applications that require photoresist, from basic coating processes to complex circuit fabrication.
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