Used FSI / TEL / TOKYO ELECTRON PVDF Turntable for Mercury MP #9384397 for sale

FSI / TEL / TOKYO ELECTRON PVDF Turntable for Mercury MP is a photoresist equipment that enables mounting and processing of semiconductor wafers in a controllable radius. It uses the pulse-width modulation technology to enable precise control over the wafer radius. The process involves mounting a torodial spindle to the motor and controling it to adjust the radius of the wafer. FSI PVDF Turntable for Mercury MP supports the full range of FSI Control Unit for TEL Turntable for Heat and Mercury MP Photoresist Processes. The EH-030TTEL PVDF Turntable for Mercury MP has several features designed to promote accurate and safe precision operation of the system. It includes an eccentrically mounted mount/unload platform for the wafers that ensures that the wafers are centred. It also features an ERPM motor and spindle that allow for high speed wafer spin in precision controlled circles for uniformity and accuracy. The motor is brushless and completely enclosed by a protective housing to prevent any dust and residue collecting. The EH-030TPVDF Turntable for Mercury MP also features over voltage protection (OVP), a high power stage to prevent overheating, and integrated temperature control for accuracy. It is calibrated for accuracy and includes a monitor/printer port for software based calibration. The wafer centring feature ensures precise centring of the wafers and the PVDF coating prevents abrasion of the wafer surface. The process operation of the EH-030TTOKYO ELECTRON PVDF Turntable for Mercury MP is quick and efficient. It is inherently safe as the spindle and all moving parts are enclosed in the protective housing. The pulse-width modulation ensures evenness of exposure of the resist to the mercury light emitted from the unit. This ensures a consistent and quality resist layer is applied to the wafer. In conclusion, FSI / TEL / TOKYO ELECTRON PVDF Turntable for Mercury MP is a photoresist machine that offers an efficient and safe process for mounting and processing semiconductor wafers in a controllable radius. It includes a mounts/unload platform for precision, an enclosed motor for dust prevention, temperature control for accuracy, and pulse-width modulation technology for consistency of exposure of the resist to the mercury light. It is a reliable tool for those looking for a high quality resist layer on their semiconductor wafers.