Used FSI / TEL / TOKYO ELECTRON Reflex #293662028 for sale

FSI / TEL / TOKYO ELECTRON Reflex photoresist equipment is an advanced photolithography system designed to enable the processing of high-resolution patterns on semiconductor wafers. The unit utilizes complex optics and advanced lens designs to achieve high-resolution imaging of semiconductor wafers. FSI Reflex machine utilizes a multi-wavelength illuminator to provide uniform and precise illumination of the wafer surface. The tool is capable of illuminating the wafer surface with multiple wavelengths simultaneously, enabling photolithographic exposures of multiple layers simultaneously. The illuminator is equipped with filters to allow for selective illumination of the various photoresist layers. TEL Reflex asset is equipped with a laser scanner which enables high-resolution imaging of the wafer surface. The laser scanner is capable of scanning the wafer surface at an extremely high speed. The model is capable of scanning a 3.7mm x 3.7mm square area at a rate of 8,000 scans per second, and an 8mm x 8mm square area at a rate of 1 scan per second. TOKYO ELECTRON Reflex equipment is also equipped with an integrated system controller which allows for precise manipulation of the unit parameters. The controller is capable of controlling the machine parameters of the laser scanner, the illuminator, and the illumination filters. The controller is also capable of monitoring the photoresist layer thickness and the wafer reflectivity. Reflex tool is compatible with a range of advanced photoresist materials, including i-line, deep UV, and x-ray. The asset is capable of processing a range of photoresist patterns, including line and space patterns, contact holes, and several other pattern geometries. The model is also capable of processing multiple layer photoresist patterns, such as interlayer dielectric layers. FSI / TEL / TOKYO ELECTRON Reflex equipment is simple to use and maintain. The system is self-contained and requires minimal maintenance. The unit is capable of automatically controlling temperature and humidity levels to ensure optimal performance. The users can easily modify the machine parameters and settings using the integrated tool controller. FSI Reflex asset is an advanced photolithography model designed to enable the processing of high-resolution patterns on semiconductor wafers. The equipment utilizes a multi-wavelength illuminator, a laser scanner, and an integrated system controller to achieve high-resolution imaging of the wafer surface. The unit is capable of automatically controlling temperature and humidity levels to ensure optimal performance. The users can easily modify the machine parameters and settings using the integrated tool controller. The asset is compatible with a range of advanced photoresist materials and provides a simple and efficient means of processing multiple layer photoresist patterns.