Used FSI / TEL / TOKYO ELECTRON Saturn MP #9233649 for sale

ID: 9233649
System.
FSI / TEL / TOKYO ELECTRON Saturn MP is a fully-automated high-resolution photoresist equipment designed to facilitate the manufacture of ultra-micro sensitive devices such as MEMS (microelectrical mechanical systems) and biomedical devices. Featuring advanced exposure control with low-dose uniformity, this system is suitable for processing substrates up to 4 inches in size with a 100 μm feature size. FSI Saturn MP is equipped with a digital polygonal scanner which enables the unit to achieve a resolution of up to 5 μm in a single pass. This scanner is capable of scanning in both single-target and multi-target modes, providing users with flexibility when it comes to fine-tuning the treatment. In addition, the machine features a special calibration table to guarantee precise alignments when using any of the various overlay software which the tool is compatible with. TEL Saturn MP also provides users with an intuitive interface that allows for easy setup and operation, making it ideal for even novice users. It supports various substrates, including Si (silicon), polymer, glass and quartz materials, as well as traditional wet processes. All of these features make the asset highly versatile, allowing for effective patterning of even the most challenging materials. The model is also capable of tracking and recording process data which is invaluable for learning and troubleshooting. This feature is especially beneficial when dealing with complex substrates, as the equipment can provide users with a detailed analysis of their patterns and optimization results. For added convenience, TOKYO ELECTRON Saturn MP is offered with a modular designed chemistry station, allowing for quick and easy replacement when needed. This could be especially useful when dealing with substrate materials which require specialized processing. Overall, Saturn MP is a state-of-the-art photoresist system designed to make the manufacture of ultra-micro sensitive devices easier and more efficient. With its advanced exposure control, intuitive interface, and modular designed chemistry station, this unit provides users with a powerful and reliable photoresist solution.
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