Used FSI / TEL / TOKYO ELECTRON Saturn #9036933 for sale

FSI / TEL / TOKYO ELECTRON Saturn is a photoresist equipment, designed to provide a precise and accurate lithography process for the production of complex, high-density semiconductor devices. The photoresist system is comprised of a light source, a projection optics unit and a process chamber. The light source provides ultraviolet light to expose the photoresist over the surface of the wafer. The projection optics machine projects the image of the pattern onto the wafer, allowing for precise and accurate placement of structures. The process chamber provides a pressurized, professional lithographic environment for the wafer to be exposed in. FSI Saturn photoresist tool is capable of deep ultraviolet (DUV) radiation exposure on devices such as magnetic random access memory (MRAM), static random access memory (SRAM), digital signal processing (DSP), asset on a chip (SoC), field programmable gate arrays (FPGAs) and microprocessors. The model can expose circuits on substrate materials such as silicon, germanium, piezoelectric quartz and other similar materials. The default development application of the equipment is to provide minimum feature sizes ranging from 0.14um to 0.6um, while also utilizing uniform resolution across the entire range of exposure space. Exposure methods include top-down single wafer exposure, side-by-side exposure and multiple mask exposures. TEL Saturn photoresist system is also capable of ultra-precise pattern alignment with the use of on-wafer alignment marks, allowing for accuracy down to 0.037 micrometers. TOKYO ELECTRON Saturn photoresist unit is designed to provide a reliable and simple platform for the development of micro-scale devices. The machine has low power consumption and can be equipped with both large-scale and small-scale process chambers. It utilizes a long-wavelength UV source to ensure precise lithography exposure and employs advanced optics technology for a clean and uniform process. The tool is equipped with an integrated motorized wafer stage, allowing for precise controllability and accuracy when aligning the shot. In addition, Saturn photoresist asset is designed with a touch-screen interactive control interface that allows for easy operation and monitoring of the lithographic process. Overall, FSI / TEL / TOKYO ELECTRON Saturn photoresist model provides users with a reliable, accurate and precise platform for the development of micro-scale devices. The various exposure methods, combination of motorized wafer stage and long-wavelength UV source allow the equipment to provide feature sizes ranging from 0.14um to 0.6um with uniform resolution across the entire exposure space. Its powerful software customization features and touch-screen interactive control interface make the system an easy and effective solution for various lithographic processes.