Used FSI / TEL / TOKYO ELECTRON TITAN #9364338 for sale

FSI / TEL / TOKYO ELECTRON TITAN is a photoresist equipment designed for advanced lithography applications. It features a high-resolution, precise optical system with a long depth of focus that enables the use of a wide variety of resists. The unit consists of a high-resolution pressure reduction optical machine, a low-pressure imaging chamber, a multi-mode or single-mode exposure source, and an automated control tool. This asset is used for advanced photolithography processes, such as sub-micrometer image transfer and circuit cutting. It also helps to reduce the cost and time for the exposure process. In addition, it offers improved precision and reliability, excellent repeatability, and improved inspection accuracy. The model can be used for a variety of materials, including polymers, high-k dielectric films, III-V compounds, and metals. It offers an optimized resist process to achieve both patterning and profile control. This means that the same parameters can be used to process surfaces of different materials. The equipment also provides the flexibility to apply various imaging techniques that are based on the same system platform. These techniques include amplitude-modulated, phase-shifted, and combination lithography. Moreover, the unit provides improved defect detection accuracy thanks to its high resolution optics. The components of the machine include the source, detector, and optics. The optics consist of a telecentric lens, a high power condenser, and a demagnification optic. The source includes a pulsed laser, and the detector consists of Gauss filters and a linear array of detector elements. The imaging tool is designed to deliver a uniform positive distortion image, and it can be used for both positive and negative resists. Overall, FSI TITAN is an easy-to-use, reliable photoresist asset. Its long depth of focus and high-resolution optics make it ideal for advanced lithography applications. It offers improved precision and reliability, excellent repeatability, and improved inspection accuracy. Additionally, its multi-mode and single-mode exposure source enables the application of a variety of resist processes to achieve patterning and profile control.