Used FSI / TEL / TOKYO ELECTRON Transfer Chamber #293665124 for sale

FSI / TEL / TOKYO ELECTRON Transfer Chamber is a photoresist equipment used to create advanced micro-electronic devices. The system uses photolithography to etch patterns onto a silicon wafer substrate to create features of complex electronic or microchip devices. This unit is made up of several components, including a photoresist application station, a mask aligner, and a bake machine. The photoresist application station applies photoresist, a photosensitive material, to the wafer substrate using spin coating. This process involves rotating the wafer on a chuck while coating it with a liquid photoresist-solvent solution. Once the solution has been applied, the wafer is exposed to ultraviolet (UV) light. The UV light activates photolithographic patterns on the wafer that are designated by a mask or stencil. The next component, the mask aligner, is used to precisely register the wafer with the mask. This makes sure that the patterns on the mask perfectly match the patterns on the wafer. The registration is performed by a laser interferometer that measures the distance between the wafer and the mask. The final component is the bake tool. After alignment, the wafer is placed in an oven to heat it up. This hardening process crosslinks the photoresist into a durable, longer-lasting form that can withstand subsequent etching processes. Once the hardening process is complete, the etching process can begin. This etching is used to remove unwanted layers of silicon and create patterns to form the desired device components. FSI Transfer Chamber is an advanced photolithography asset used to create complex micro-electronic devices. It consists of components such as a photoresist application station, a mask aligner, and a bake model, each of which works together to etch patterns onto the substrate. Together, these tools provide the necessary precision and accuracy required for the development and production of advanced electronic devices.