Used FSI / TEL / TOKYO ELECTRON Zeta 200 #293640583 for sale

FSI / TEL / TOKYO ELECTRON Zeta 200 is a specialized photoresist equipment designed for advanced photolithographic patterning applications. It simplifies the process of photo-lithographic patterning, in which a light-sensitive material is used to create patterns on a substrate. The system is capable of high levels of accuracy and resolution, up to 4 μm. The unit has a wide range of exposure wavelength coverage from 350 nm to 450 nm, and it can also work under ultraviolet light UV-FEL or HeNe-laser irradiation sources. It features multiple mask sizes and a choice of materials, such as quartz or fused silica masks. The machine includes an advanced pre-aligner with a highly efficient, high-resolution auto-detection tool that includes an auto-correction function. This asset automatically detects the location of the substrate and the pattern, then precisely aligns the substrate in order to minimize errors due to mask shift or focus change. FSI Zeta 200 features advanced imaging and focus control with a Built-in Model-wide Focus Adjustment (WSFA) function, which enables quick and accurate lithographic patterning. The photoresist material is loaded into TEL Zeta 200 from cassettes, and the usage status is tracked by a equipment of online and offline controls. A quick-charging feature enables the user to optimize dark room efficiency. For high-resolution photolithography, the system has an advanced SE (Sub-resolution Acceleration) function and a JPEG-2000 data compression feature. SE allows rapid patterning on the substrate with low line-width and higher throughput, and the JPEG-2000 data compression supports large pattern data with uniform high quality. Zeta 200 is designed to provide efficient, accurate, and high-resolution patterning with a highly productive workflow. With its robust unit design, advanced imaging and focus control, and user-friendly operation, the machine is ideal for photoresist-based lithography applications.