Used FSI / TEL / TOKYO ELECTRON Zeta 200 #293798027 for sale

FSI / TEL / TOKYO ELECTRON Zeta 200 is a cutting-edge photoresist equipment designed to rapidly create uniform micro-circuit structures within highly accurate photomasks. With a high-resolution laser-scanning function, this system is able to convert complex data into physical circuit structures, making it an ideal choice for multiple lithography applications. It utilizes a novel laser-optical unit that is capable of producing nanometer-level circuit patterns with repeat accuracy and low distortion. Its unique open-architectures optical machine provides unprecedented flexibility, allowing for use in various illumination conditions, allowing for high production throughput. FSI Zeta 200 has a uniquely designed cooling tool for optimal printing performance, using air to reduce both thermal and column emission to improve stability. Its advanced data management systems support multiple user settings, featuring a restorable topographic image output, enabling effective multi-device manufacturing. The photomask produced by TEL Zeta 200 has a powerful EDVAS asset, providing excellent pattern accuracy, robust alignment, and reliable mask-making process control. Further, this model is equipped with a new level of computer-aided design (CAD), photomask correction, and back end printing assessment. The equipment allows multiple simulations of various parameters to accurately determine accurate resist criteria, the best exposure time, and other parameters. Zeta 200 is the foundation of a highly reliable and effective photoresist process. Its key components include a robust optical system, a powerful EDVAS, and an advanced cooling unit to ensure maximum precision and performance. Through a unique combination of technologies, this machine is capable of producing highly precise micro-circuits in a short turnaround time. Its combination of repeat accuracy, high throughput, and scalability makes it an excellent choice for a wide variety of advanced lithography applications.