Used FSI / TEL / TOKYO ELECTRON Zeta 200 #9031466 for sale
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ID: 9031466
Wafer Size: 8"
Vintage: 2002
Spray cleaning system, 8"
Robot options are available
2002 vintage.
FSI / TEL / TOKYO ELECTRON Zeta 200 Photoresist Equipment is a sophisticated lithography and thin-film deposition system used in semiconductor device fabrication. It is designed for high-precision patterning processes on a variety of substrates from quartz wafers to nanostructures and other complex structures. Its capabilities include patterning across multiple dimensions with precise wafer alignment and superior optical performance. At the core of FSI Zeta 200 unit is a high-resolution scanning electron beam (SEB) with up to 3D capabilities. The SEB is able to physically transfer sophisticated patterns onto a substrate with a high degree of precision and accuracy. The SEB's features include an intuitive graphical user interface (GUI) for controlling beam spot size, beam current, and exposure dose. Additionally, the SEB provides precise and rapid scanning of chemical compositions and geometries in order to create intricate patterns. The machine also boasts an automated wafer alignment feature that enables precise alignment of the beam profile onto the target substrate. TEL Zeta 200 also utilizes several types of photoresists for critical areas of the patterning process. It works with positive, negative, and dual-tone photoresists and can deposit photosensitive materials on a variety of wafer materials such as quartz, silicon, and gallium arsenide. It has a proven capability to pattern lithographic masks with a resolution of 1.0μm or smaller. TOKYO ELECTRON Zeta 200 is versatile and can easily be customized for specific applications. It offers simple and rapid batch processing for uniform films, along with furnace bake loading racks and a low-humidity environment for critical processes. Additionally, Zeta 200 is equipped with an industry-leading ion-beam etching tool capable of patterning to a resolution of 1.5μm. The ion-beam etching asset ensures superior etching quality and uniformity for maximum yield. FSI / TEL / TOKYO ELECTRON Zeta 200 model also offers extreme accuracy and control with improved defect rejection and enhanced process repeatability. Its radiation dampening components provide maximum protection against x-ray exposure and provide a safe, healthy working environment. This equipment is well suited for applications requiring a high degree of accuracy and reliability. It has been used in the fabrication of MEMS devices, nanodevices, OLED displays, and other semiconductor devices.
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