Used FSI / TEL / TOKYO ELECTRON Zeta 300 G3 #293600193 for sale

FSI / TEL / TOKYO ELECTRON Zeta 300 G3 Photoresist equipment is an advanced photolithography tool which is used in the manufacture of semiconductor devices and other electronic products. The system consists of a worktable, photomask reticle stage, lithography head, photoresist sprayer, and a controller. The worktable provides a stable platform for the other components and is used for the spacer assembly, wafer placement, and off-loading operations. The lithography head is a biaxial, four-axis motorized stage, capable of providing high accuracy and repeatability over a wide range of acceleration and travel velocities. The photomask reticle stage is a precision XY-scanning stage and utilizes high-resolution, high-accuracy sensors to provide accurate positioning feedback. The photoresist sprayer is used for uniform coating of the wafer surface. The controller provides for the operation of the unit, performing calculations to maintain the necessary camera exposure settings, controlling the motion of the lithography head and reticle stage, and interfacing with the external driving force. FSI Zeta 300 G3 Photoresist machine is designed for high-resolution and high-throughput production of wafers. It is capable of processing substrates up to 150 mm in diameter, with a minimum feature size of 2.5 µm. The tool utilizes advanced technologies such as advanced distance measurement (ADM), closed-loop photoresist expiration control, and low drift remote operation features. It also includes a patented, automated optics maintenance asset, which ensures that the optics are safe and functional. TEL Zeta 300 G3 Photoresist model provides high performance, accuracy and integration of multiple systems, resulting in increased yield and decreased cycle time in the manufacturing process. It is also compatible with a wide range of chemicals, photomasks, and electron-beam instruments.